Crack-Free High-Composition
In this article, a high-composition (>35%) thick-barrier (>30 nm) AlGaN/AlN/GaN high-electron-mobility transistor (HEMT) structure grown on a sapphire substrate with ultra-low sheet resistivity (<250 Ω/□) is reported. The optimization of growth conditions, such as reduced deposition rate, a...
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Published in | Crystals (Basel) Vol. 13; no. 10 |
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Main Authors | , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
MDPI AG
01.09.2023
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Subjects | |
Online Access | Get full text |
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