Ultraviolet-assisted cold poling of PbO.sub.3 films
This paper discusses the advantages of a room-temperature poling procedure during exposure to ultraviolet light for Pb(Zr.sub.0.52Ti.sub.0.48)O.sub.3 (PZT) films. The results of these experiments include the following: for 1.7-[micro]m-thick chemical solution-deposited PZT films, the saturation phot...
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Published in | Journal of materials science Vol. 53; no. 10; p. 7180 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
Springer
01.05.2018
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Subjects | |
Online Access | Get full text |
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Summary: | This paper discusses the advantages of a room-temperature poling procedure during exposure to ultraviolet light for Pb(Zr.sub.0.52Ti.sub.0.48)O.sub.3 (PZT) films. The results of these experiments include the following: for 1.7-[micro]m-thick chemical solution-deposited PZT films, the saturation photocurrent density after a 10 min white light exposure (190-1900 nm) (no DC bias field applied) increased up to 0.066 [micro]A/cm.sup.2 with increasing Cr thickness of top electrode in Cr/Pt bilayer electrodes. Furthermore, the d.sub.33,f piezoelectric coefficients for UV-poled samples were 40 and 20% higher than those achieved from field-only poling at either room temperature or 150 °C. Additionally, the development of an internal bias field and pinching were investigated in major and minor polarization-electric field loops. It was found that ultraviolet illumination during the poling process produced photoinduced charge carriers that became trapped by local defects and/or grain boundaries in the films. |
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ISSN: | 0022-2461 1573-4803 |
DOI: | 10.1007/s10853-018-2069-y |