Structure, composition, and physicomechanical characteristics of Hf[B.sub.2] and Hf-B-N films

• Published in: Physics of metals and metallography Vol. 114; no. 1; p. 95
• Main Authors: Goncharov, A.A, Dub, S.N, Agulov, A.V
• Format: Journal Article
• Language: English
• Published: Springer 01.01.2013
• Subjects: Coatings; Coatings industry
• ISSN: 0031-918X; 1555-6190
• DOI: 10.1134/S0031918X12110063

The paper deals with the study of the effect of the deposition conditions (the bias potential and substrate temperature) on the structure, composition, and physicomechanical characteristics of nanocrystalline films of hafnium diboride and boridonitride formed by the method of nonreactive (in Ar) and reactive (in Ar + [N.sub.2]) HF magnetron sputtering, respectively. The optimal conditions for the deposition of the hafnium diboride coatings with growth texture in plane (00.1) and the best physicomechanical characteristics are determined. It is shown that at a bias potential of [+ or -]50 V and a substrate temperature of ~500°C superstoichiometric highly textured films are formed with a nanohardness of 44 GPa and an elastic modulus of 396 ± 11 GPa. A relation between the composition, structure, and physicomechanical characteristics of the films is found. Reactive sputtering in (Ar + [N.sub.2]) makes it possible to produce amorphous-crystalline films of the composite (Hf[B.sub.2] + BN) that consists of grains of the Hf[B.sub.2] nanocrystalline phase, the spaces between which are filled with the amorphous phase of graphite-like BN. Keywords: nanocrystalline films, hafnium diboride, diffraction pattern DOI: 10.1134/S0031918X12110063