CHARGED-PARTICLE SOURCE, CONTROL SYSTEM, AND PROCESS

A control system and process for operating a charged-particle source which achieves gating of the charged-particle beam without a mechanical shutter and with very short transition between the beam "on" and beam "off" states is presented. The process and control system provide ver...

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Bibliographic Details
Main Authors OSTAN, EDWARD, W, HAYES, ALAN, V, NAVY, ABRAHAM, J, TREYGER, GENRIKH, JACOB, JOHN, LAKIOS, EMMANUEL, N, FREMGEN, ROGER, P., JR, KANAROV, VICTOR
Format Patent
LanguageEnglish
French
Published 07.01.1999
Edition6
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:A control system and process for operating a charged-particle source which achieves gating of the charged-particle beam without a mechanical shutter and with very short transition between the beam "on" and beam "off" states is presented. The process and control system provide very precise control of the duration of the charged-particle extraction. Système de commande et procédé pour actionner une source de particules chargées, permettant de moduler le faisceau de particules chargées sans obturateur mécanique, avec une transition très brève entre les états "marche" et "arrêt" du faisceau. Ce procédé et système de commande permet de régler de manière très précise la durée d'extraction de particules chargées.
Bibliography:Application Number: WO1998US12915