INTERNALLY COOLED TARGET ASSEMBLY FOR MAGNETRON SPUTTERING

An internally cooled target assembly for use in a magnetron sputtering apparatus is provided. The internally cooled target assembly includes a cooling plate that is configured to promote highly turbulent coolant flow through the target assembly to achieve efficient and uniform target cooling. The vo...

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Bibliographic Details
Main Authors HARRA, DAVID, J, JIANG, MINGWEI, HARTSOUGH, LARRY, D, COCHRAN, RONALD, R
Format Patent
LanguageEnglish
French
Published 27.08.1998
Edition6
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:An internally cooled target assembly for use in a magnetron sputtering apparatus is provided. The internally cooled target assembly includes a cooling plate that is configured to promote highly turbulent coolant flow through the target assembly to achieve efficient and uniform target cooling. The volume of coolant required to cool the target assembly is minimized. L'invention concerne un ensemble cible intérieurement refroidi destiné à être utilisé dans un appareil de pulvérisation au magnétron. L'ensemble cible intérieurement refroidi comprend une plaque de refroidissement agencée de manière à favoriser l'écoulement hautement turbulent d'un fluide de refroidissement, afin d'effectuer un refroidissement efficace et uniforme de la cible. Le volume de fluide de refroidissement requis pour refroidir l'ensemble cible est réduit.
Bibliography:Application Number: WO1998US02657