FILM DEPOSITION APPARATUS OR ARTIFICIAL LATTICE MULTI-LAYERED FILM

• Main Authors: MAEKAWA, SUMIO, ONAKA, KAZUHIRO, YAMAMOTO, SHIGERU, OKAMOTO, MASAFUMI
• Format: Patent
• Language: English; French; Japanese
• Published: 20.08.1998
• Edition: 6
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; INDUCTANCES; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MAGNETS; METALLURGY; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSFORMERS

A film deposition apparatus of an artificial lattice multi-layered film for depositing a gigantic magnetoresistive film (GMR film) having an artificial lattice structure formed by alternately laminating magnetic metal films and non-magnetic metal films on a substrate, and for making it possible to d...