PROCESS FOR CHANGING THE MICROSTRUCTURE OF METALLIC RAILS

A process is disclosed for changing the local microstructure at the surface of the head of a metallic rail in the solid phase. The microstructure is changed by applying energy only within a limited local marginal layer located directly below the stressed running and wearing surfaces of the rail head...

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Bibliographic Details
Main Authors SCHMEDDERS, HERBERT, KUEPPER, FRANK, WISSENBACH, KONRAD
Format Patent
LanguageEnglish
French
German
Published 31.03.1994
Edition5
Subjects
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Summary:A process is disclosed for changing the local microstructure at the surface of the head of a metallic rail in the solid phase. The microstructure is changed by applying energy only within a limited local marginal layer located directly below the stressed running and wearing surfaces of the rail head by high-energy radiation. The amount of energy absorbed by the rail at the processing site is controlled by said high-energy radiation in such a way that the local microstructure in the marginal layer at the processing site is cooled in an adequately controlled way. L'invention concerne un procédé visant à modifier la microstructure locale à la surface d'un champignon de rail métallique dans la phase solide. La modification de la microstructure s'opère par apport d'énergie uniquement dans une couche marginale locale, limitée, située directement sous les surfaces sollicitées de roulement et d'usure du champignon de rail, par irradiation à haute énergie. Cette irradiation à haute énergie permet de contrôler la quantité d'énergie absorbée par le rail, à l'endroit du traitement, de manière à obtenir un refroidissement adéquatement contrôlé de la microstructure locale de la couche marginale à l'endroit du traitement.
Bibliography:Application Number: WO1993DE00907