ENHANCING EFFICIENCY OF RESIST PATTERNING

• Main Authors: HOD, Manuela, YOGEV, Ronen, GOLD, Uri, FOGEL, Ofer
• Format: Patent
• Language: English; French
• Published: 08.08.2024
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACHINE TOOLS; MATERIALS THEREFOR; METAL-WORKING NOT OTHERWISE PROVIDED FOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; SOLDERING OR UNSOLDERING; TRANSPORTING; WELDING; WORKING BY LASER BEAM

A direct imaging system includes an ultraviolet radiation source, which is configured to irradiate a first area, having a first width, of a layer of a photoreactive material on a substrate with patterned ultraviolet radiation. A thermal energy source is configured to heat a second area of the layer of the photoreactive material while the ultraviolet radiation source irradiates the first area. The second area contains a part of the first area and having a second width less than the first width. Un système d'imagerie directe comprend une source de rayonnement ultraviolet qui est conçue pour irradier une première zone, ayant une première largeur, d'une couche d'un matériau photoréactif sur un substrat avec un rayonnement ultraviolet à motifs. Une source d'énergie thermique est conçue pour chauffer une seconde zone de la couche du matériau photoréactif pendant que la source de rayonnement ultraviolet irradie la première zone. La seconde zone contient une partie de la première zone et a une seconde largeur inférieure à la première largeur.