LOAD LOCK CHAMBER AND CLEANING METHOD THEREFOR, AND SEMICONDUCTOR DEVICE

The present application relates to a load lock chamber and a cleaning method therefor, and a semiconductor device. The load lock chamber comprises a chamber body. The chamber body is internally provided with at least one load-lock, and is provided with an air inlet portion and an air outlet portion...

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Bibliographic Details
Main Authors SHI, Shuai, WU, Liuxing, ZHOU, Ren
Format Patent
LanguageChinese
English
French
Published 04.07.2024
Subjects
BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
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Summary:The present application relates to a load lock chamber and a cleaning method therefor, and a semiconductor device. The load lock chamber comprises a chamber body. The chamber body is internally provided with at least one load-lock, and is provided with an air inlet portion and an air outlet portion which are communicated with each load-lock. The chamber body is provided with at least one dispersion portion, each dispersion portion is arranged to correspond to one load-lock, each dispersion portion comprises a plurality of independently formed dispersion holes, and each dispersion hole is communicated with the air inlet portion and the corresponding load-lock and is used for dispersing airflow entering the corresponding load-lock. La présente demande concerne une chambre de verrouillage de charge et son procédé de nettoyage, ainsi qu'un dispositif à semi-conducteur. La chambre de verrouillage de charge comprend un corps de chambre. Le corps de chambre est pourvu à l'intérieur d'au moins un verrou de charge, et
Bibliography:Application Number: WO2023CN135344