SURFACE TOPOLOGIES OF ELECTROSTATIC SUBSTRATE SUPPORT FOR PARTICLE REDUCTION

A substrate support for use in a processing chamber to hold a substrate thereon includes a substrate support body, and a plurality of mesas on recessed surfaces of the substrate support body, wherein heights of the plurality of mesas from the recessed surfaces vary over the substrate support body be...

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Bibliographic Details
Main Authors BEAUDRY, Christopher, CHADHA, Arvinder Manmohan Singh
Format Patent
LanguageEnglish
French
Published 20.06.2024
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A substrate support for use in a processing chamber to hold a substrate thereon includes a substrate support body, and a plurality of mesas on recessed surfaces of the substrate support body, wherein heights of the plurality of mesas from the recessed surfaces vary over the substrate support body between at least two different heights. Un support de substrat destiné à être utilisé dans une chambre de traitement pour maintenir un substrat sur celui-ci comprend un corps de support de substrat, et une pluralité de mésas sur des surfaces évidées du corps de support de substrat, les hauteurs de la pluralité de mésas à partir des surfaces évidées variant sur le corps de support de substrat entre au moins deux hauteurs différentes.
Bibliography:Application Number: WO2023US35024