FLUSHING SYSTEM AND METHOD FOR A LITHOGRAPHIC APPARATUS

There is provided a flushing system for a lithographic apparatus, said flushing system including a gas outlet configured to choke a flow of gas passing through the gas outlet at a predetermined rate. Also provided is a method of flushing a lithographic apparatus, the method including providing a flo...

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Bibliographic Details
Main Authors VAN DEN AKKER, Emericus, HAZARI, Syed Aaquib, DANNENBERG, Johan, KALKMAN, Ivo, LINTHORST, Mart
Format Patent
LanguageEnglish
French
Published 20.06.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:There is provided a flushing system for a lithographic apparatus, said flushing system including a gas outlet configured to choke a flow of gas passing through the gas outlet at a predetermined rate. Also provided is a method of flushing a lithographic apparatus, the method including providing a flow of gas through the lithographic apparatus and operating a gas outlet from the lithographic apparatus such that the flow of gas is choked through the gas outlet. L'invention concerne un système de rinçage pour un appareil lithographique, ledit système de rinçage comprenant une sortie de gaz conçue pour étrangler un écoulement de gaz circulant dans la sortie de gaz à une vitesse prédéterminée. L'invention concerne également un procédé de rinçage d'appareil lithographique, le procédé consistant à fournir un écoulement de gaz dans l'appareil lithographique et à faire fonctionner une sortie de gaz à partir de l'appareil lithographique de façon à ce que l'écoulement de gaz soit étranglé à travers la sortie de gaz.
Bibliography:Application Number: WO2023EP82194