SPECTRAL SENSING OF PROCESS CHAMBER CONDITIONS

• Main Authors: SAWLANI, Kapil, SAKIYAMA, Yukinori, YEE, Benjamin Tong
• Format: Patent
• Language: English; French
• Published: 06.06.2024
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Methods, apparatus, and various use applications for spectral sensing of a condition of a process chamber of a semiconductor device manufacturing apparatus are provided. L'invention concerne des procédés, un appareil et diverses applications d'utilisation pour la détection spectrale d'un état d'une chambre de traitement d'un appareil de fabrication de dispositif à semi-conducteur.