METAL-ORGANIC FRAMEWORK FILM AND METHOD FOR PRODUCING SAME

The present invention provides a metal-organic framework (MOF) film having a higher gas adsorption rate. The present invention pertains to a metal-organic framework film in which the surface is covered with protrusions and the average adjacent distance p of the protrusions is 1-100 nm. La présente i...

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Bibliographic Details
Main Author OOE, Hideaki
Format Patent
LanguageEnglish
French
Japanese
Published 30.05.2024
Subjects
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
THEIR RELEVANT APPARATUS
TRANSPORTING
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Summary:The present invention provides a metal-organic framework (MOF) film having a higher gas adsorption rate. The present invention pertains to a metal-organic framework film in which the surface is covered with protrusions and the average adjacent distance p of the protrusions is 1-100 nm. La présente invention concerne un film à réseau organométallique (MOF) ayant un taux d'adsorption de gaz plus élevé. La présente invention concerne un film à réseau organométallique dans lequel la surface est recouverte de parties saillantes et la distance adjacente moyenne p des parties saillantes est comprise entre 1 et 100 nm. 本発明は、ガス吸着速度がより高い金属有機構造体（ＭＯＦ）膜を提供する。本発明は、表面が突起で覆われており、前記突起は１ｎｍ以上１００ｎｍ以下の平均隣接距離ｐを有している、金属有機構造体膜に関する。
Bibliography:Application Number: WO2023JP28969