CLEANING LIQUID AND SUBSTRATE CLEANING METHOD

• Main Authors: GO Choitsu, WADA Yukihisa
• Format: Patent
• Language: English; French; Japanese
• Published: 10.05.2024
• Subjects: ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES; BASIC ELECTRIC ELEMENTS; CANDLES; CHEMISTRY; DETERGENT COMPOSITIONS; DETERGENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FATTY ACIDS THEREFROM; METALLURGY; RECOVERY OF GLYCEROL; RESIN SOAPS; SEMICONDUCTOR DEVICES; SOAP OR SOAP-MAKING; USE OF SINGLE SUBSTANCES AS DETERGENTS

This cleaning liquid is for cleaning a substrate having a metal exposed on the surface thereof, and contains an alkanol hydroxylamine, a chelating agent, and water. The pH of the cleaning liquid at 23°C is lower than 10. Ce liquide de nettoyage est destiné à être utilisé pour nettoyer un substrat ayant un métal apparent sur sa surface, et contient une alcanolhydroxylamine, un agent chélatant et de l'eau. Le pH du liquide de nettoyage à 23 °C est inférieur à 10. 金属が表面に露出した基板を洗浄するための洗浄液であって、アルカノールヒドロキシルアミンと、キレート剤と、水と、を含み、前記洗浄液の２３℃におけるｐＨが１０未満である、洗浄液。