TRANSPARENT ELECTRODE FILM, MANUFACTURING METHOD THEREFOR, AND DEVICE COMPRISING SAME

• Main Authors: RYU, Hyun-Sun, LEE, Won-Bok, KIM, Hyun-Seong
• Format: Patent
• Language: English; French; Korean
• Published: 22.02.2024
• Subjects: BASIC ELECTRIC ELEMENTS; CABLES; CONDUCTORS; ELECTRICITY; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES

The present invention relates to a transparent electrode film, a manufacturing method therefor, and a device comprising same, the electrode film comprising a transparent substrate and an electrode layer arranged on both sides of the transparent substrate, wherein the thickness of the electrode layer is 200-1,000 nm, and the electrode layer has, in a tensile strain of 1-10%, a crack density of 0- 0.2, calculated according to formula 1. La présente invention concerne un film d'électrode transparent, son procédé de fabrication, et un dispositif le comprenant, le film d'électrode comprenant un substrat transparent et une couche d'électrode disposée sur les deux côtés du substrat transparent, l'épaisseur de la couche d'électrode étant de 200 à 1 000 nm, et la couche d'électrode ayant, dans une contrainte de traction de 1 à 10 %, une densité de fissure de 0 à 0,2, calculée selon la formule 1. 본 발명은, 투명 기재; 및 상기 투명 기재의 양면 상에 배치되는 전극층을 포함하는 전극 필름으로, 상기 전극층의 두께는, 200 nm 내지 1,000 nm이고, 상기 전극층은, 1% 내지 10%의 인장 변형률에서, 식 1에 따라 산출된 크랙 밀도 값이 0 내지 0.2인, 투명 전극 필름, 이의 제조 방법 및 이를 포함하는 디바이스에 관한 것이다.