APPARATUS FOR AND METHOD OF SUPPLYING GAS TO A LITHOGRAPHY SYSTEM

Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the introduction of a small amount of a first gas into a vacuum chamber containing the optical element, with the first gas being separated from a starting gas such as CDA...

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Bibliographic Details
Main Authors ZHANG, Kevin Weimin, ZHU, Qiushi, MA, Yue
Format Patent
LanguageEnglish
French
Published 01.02.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the introduction of a small amount of a first gas into a vacuum chamber containing the optical element, with the first gas being separated from a starting gas such as CDA or XCDA. The first gas may be added to the flow of another gas such as hydrogen. La dégradation de la réflectivité d'un ou de plusieurs éléments optiques réfléchissants dans un système de génération de rayonnement EUV est réduite grâce à l'introduction d'une petite quantité d'un premier gaz dans une chambre à vide contenant l'élément optique, le premier gaz étant séparé d'un gaz de départ tel que l'air sec propre (CDA) ou le XCDA. Le premier gaz peut être ajouté au flux d'un autre gaz tel que l'hydrogène.
Bibliography:Application Number: WO2023EP69096