COMPOSITION, RESIN COMPOSITION, FILM FORMATION COMPOSITION, PATTERN FORMATION METHOD, AND COMPOUND

• Main Authors: KOGUMA, Takeru, IINUMA, Masataka, KATAOKA, Kentaro, HORIUCHI, Junya, MATSUMOTO, Masahiro, MATSUURA, Kodai, OKADA, Yu, MAKINOSHIMA, Takashi, YAMAMOTO, Hiroaki, OMATSU, Tadashi, NIIMI, Yushi, ECHIGO, Masatoshi, SATO, Takashi
• Format: Patent
• Language: English; French; Japanese
• Published: 04.01.2024
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

This composition comprises a compound (A) represented by formula (1) below and a compound (B) represented by formula (2) below. (The definitions of the elements in formula (1) are indicated in the description.) (In formula (2), the elements X, L1, Y, Ra, Rb, Rc, A, Z, p, m, n, and r are the same as those in formula (1), and k represents an integer from 0 to 2.) Cette composition comprend un composé (A) représenté par la formule (1) ci-jointe et un composé (B) représenté par la formule (2) ci-jointe. (Les définitions des éléments dans la formule (1) sont indiquées dans la description.) (Dans la formule (2), les éléments X, L1, Y, Ra, Rb, Rc, A, Z, p, m, n et r sont les mêmes que ceux dans la formule (1), et k représente un nombre entier compris entre 0 et 2.) 下記式（１）で表される化合物（Ａ）と、下記式（２）で表される化合物（Ｂ）とを含む組成物。 （式（１）中、各定義については明細書中に示す。） （式（２）中、　Ｘ、Ｌ１、Ｙ、Ｒａ、Ｒｂ、Ｒc、Ａ、Ｚ、ｐ、ｍ、ｎ、及びｒは式（１）の記載と同じ内容であって、ｋは０以上２以下の整数を表す。）