OPTICAL CRITICAL DIMENSIONS (OCD) METROLOGY FOR THICK STACKS

A method for evaluating a thick transparent layer, the method includes (i) generating information about relationships between measurements of a spectrometer of an interferometer and optical path difference (OPD) values of the interferometer; wherein the generating of the information comprises illumi...

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Bibliographic Details
Main Authors SHAYARI, Amir, COHEN, Oded, PRIGOZIN, Haim, BARAK, Gilad, ADAM, Ido, FERBER, Smadar, SAGIV, Amir, SCHREIBER, Yishai
Format Patent
LanguageEnglish
French
Published 04.01.2024
Subjects
COLORIMETRY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
RADIATION PYROMETRY
TESTING
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Summary:A method for evaluating a thick transparent layer, the method includes (i) generating information about relationships between measurements of a spectrometer of an interferometer and optical path difference (OPD) values of the interferometer; wherein the generating of the information comprises illuminating the thick transparent layer by the interferometer; (ii) determining one or more thick transparent layer reflection parameters, based on the information about the relationship; and (iii) determining one or more structural properties of the thick transparent layer based on the one or more thick transparent layer reflection parameters. L'invention concerne un procédé d'évaluation d'une couche transparente épaisse, le procédé comprenant (i) la génération d'informations concernant des relations entre des mesures d'un spectromètre d'un interféromètre et des valeurs de différence de trajet optique (OPD) de l'interféromètre ; la génération des informations comprenant l'éclairage de la couche transparente épaisse par l'interféromètre ; (ii) la détermination d'un ou plusieurs paramètres de réflexion de couche transparente épaisse, sur la base des informations concernant la relation ; et (iii) la détermination d'une ou plusieurs propriétés structurales de la couche transparente épaisse sur la base du ou des paramètres de réflexion de couche transparente épaisse.
Bibliography:Application Number: WO2023IB56649