VACUUM-INSULATED, HEATED REACTOR CONSTRUCTION

A sidewall assembly of a substrate processing chamber has a composite structure comprising an inner layer comprised of a first material and an inward, chamber facing surface, an outer layer that is comprised of a second material and encloses the inner layer, and a middle layer disposed around the in...

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Bibliographic Details
Main Authors DRAPER, Emile Charles, FU, Gaosheng, LEESER, Karl Frederick, WU, Yi-De
Format Patent
LanguageEnglish
French
Published 14.12.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A sidewall assembly of a substrate processing chamber has a composite structure comprising an inner layer comprised of a first material and an inward, chamber facing surface, an outer layer that is comprised of a second material and encloses the inner layer, and a middle layer disposed around the inner layer between the inner layer and the outer layer that thermally insulates the outer layer from the inner layer. Un ensemble paroi latérale d'une chambre de traitement de substrat a une structure composite comprenant une couche interne constituée d'un premier matériau et d'une surface tournée vers l'intérieur, une couche externe qui est constituée d'un second matériau et renferme la couche interne, et une couche intermédiaire disposée autour de la couche interne entre la couche interne et la couche externe qui isole thermiquement la couche externe de la couche interne.
Bibliography:Application Number: WO2023US22926