A METHOD OF DETERMINING A CORRECTION FOR CONTROL OF A LITHOGRAPHY AND/OR METROLOGY PROCESS, AND ASSOCIATED DEVICES

Disclosed is a method of determining a correction for control of at least one first component of a lithographic or metrology apparatus, and associated apparatuses. The method comprises obtaining a trained artificial intelligence model which has been trained to map input data relating to at least one...

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Bibliographic Details
Main Authors TISSINGH, Luc, EISENBERG, Martin, DE JONGH, Robertus, BUTLER, Hans
Format Patent
LanguageEnglish
French
Published 19.10.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Disclosed is a method of determining a correction for control of at least one first component of a lithographic or metrology apparatus, and associated apparatuses. The method comprises obtaining a trained artificial intelligence model which has been trained to map input data relating to at least one second component of the lithographic or metrology apparatus to a disturbance parameter related to a disturbance of said at least one first component, said disturbance having been caused by said at least one second component; obtaining input data relating to said at least one second component; and determining a compensatory correction for the disturbance parameter from said input data using the trained artificial intelligence model. L'invention concerne un procédé permettant de déterminer une correction pour la commande d'au moins un premier composant d'un appareil de lithographie ou de métrologie, ainsi que des appareils associés. Le procédé consiste à obtenir un modèle d'intelligence artificielle entraîné qui a été entraîné pour mapper des données d'entrée concernant au moins un second composant de l'appareil de lithographie ou de métrologie à un paramètre de perturbation associé à une perturbation dudit ou desdits premiers composants, ladite perturbation ayant été provoquée par ledit ou lesdits seconds composants ; à obtenir des données d'entrée concernant ledit ou lesdits seconds composants ; et à déterminer une correction compensatoire pour le paramètre de perturbation à partir desdites données d'entrée en utilisant le modèle d'intelligence artificielle entraîné.
Bibliography:Application Number: WO2023EP55495