COMPREHENSIVE INSPECTION DEVICE FOR EUV EXPOSURE PROCESS

• Main Authors: MOON, Seung Chan, LEE, Dong Gi, AHN, Jin Ho, CHOI, Jin Hyuk, KIM, Young Woong
• Format: Patent
• Language: English; French; Korean
• Published: 12.10.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CALCULATING; CINEMATOGRAPHY; COMPUTING; COUNTING; ELECTROGRAPHY; HOLOGRAPHY; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MATERIALS THEREFOR; MEASURING; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TESTING

A comprehensive inspection device for an EUV exposure process is provided. The comprehensive inspection device for an EUV exposure process may comprise: a light generation unit for generating EUV light; a splitter for receiving the EUV light from the light generation unit and splitting the EUV light into first EUV light and second EUV light; an optical characteristic evaluation unit for measuring the intensity of the first EUV light having transmitted through a pellicle, having been reflected from an object, and then having re-transmitted through the pellicle, and the intensity of the first EUV light having been directly reflected from the object without the pellicle, so as to detect reflectance and transmittance of the pellicle and reflectance of the object; and an imaging inspection unit for inspecting imaging performance of a mask by focusing the second EUV light having been reflected and diffracted from the mask through an objective lens and then collecting the focused second EUV light to obtain a spatial domain image. L'invention concerne un dispositif d'inspection complète pour un processus d'exposition aux ultraviolets extrêmes (UVE). Le dispositif d'inspection complète pour un processus d'exposition aux UVE peut comprendre : une unité de génération de lumière pour générer de la lumière UVE ; un séparateur pour recevoir la lumière UVE de l'unité de génération de lumière et la diviser en première et en seconde lumière UVE ; une unité d'évaluation des caractéristiques optiques pour mesurer l'intensité de la première lumière UVE transmise à travers une pellicule, réfléchie par un objet, puis retransmise à travers la pellicule, et l'intensité de la première lumière UVE directement réfléchie par l'objet sans la pellicule, afin de détecter la réflectance et la transmittance de la pellicule et la réflectance de l'objet ; et une unité d'inspection d'imagerie pour inspecter les performances d'imagerie d'un masque en focalisant la seconde lumière UVE qui a été réfléchie et diffractée par le masque à travers une lentille d'objectif, puis en recueillant la seconde lumière UVE focalisée pour obtenir une image dans le domaine spatial. EUV 노광공정용 종합 검사 장치가 제공된다. 상기 EUV 노광공정용 종합 검사 장치는, EUV 광을 생성하는 광 생성부, 상기 광 생성부로부터 상기 EUV 광을 제공받아 제1 EUV 광 및 제2 EUV 광으로 분리시키는 스플리터, 펠리클(pellicle)을 투과한 후, 대상체에서 반사되고, 상기 펠리클을 재투과한 상기 제1 EUV 광의 세기와 상기 펠리클 없이 상기 대상체에서 바로 반사된 상기 제1 EUV 광의 세기를 측정하여, 상기 펠리클의 반사도 및 투과도와 상기 대상체의 반사도를 검출하는 광학 특성 평가부, 및 마스크로부터 반사 및 회절된 상기 제2 EUV 광을 대물 렌즈를 통해 집속한 후 집속된 상기 제2 EUV 광을 수집하여 공간 영역 이미지를 획득함으로써, 상기 마스크의 이미징 성능을 검사하는 이미징 검사부를 포함할 수 있다.