PRODUCTION METHOD FOR HEXAGONAL BORON NITRIDE THIN FILM, LAMINATE

• Main Authors: OKACHI, Takayuki, KOHIRO, Kenji, Yamada Hisashi
• Format: Patent
• Language: English; French; Japanese
• Published: 05.10.2023
• Subjects: AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; CRYSTAL GROWTH; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE; REFINING BY ZONE-MELTING OF MATERIAL; SEMICONDUCTOR DEVICES; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE; SINGLE-CRYSTAL-GROWTH; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL

The present invention provides a production method for a hexagonal boron nitride thin film that involves a step A for preparing an iron thin film-coated substrate that includes a substrate and an iron thin film that is provided on the substrate and has a film thickness of 200-1800 nm, a step B for supplying a gas that includes a boron compound to the iron thin film-coated substrate to form an iron boride layer that includes Fe2B on the surface of the iron thin film of the iron thin film-coated substrate, and a step C for supplying at least one type of gas selected from the group that consists of nitrogen gas and gases that include a nitrogen compound to the iron thin film-coated substrate on which the iron boride layer has been formed to nitride the boron in the iron boride layer. The present invention also provides a laminate. La présente invention concerne un procédé de production d'un film mince de nitrure de bore hexagonal qui comprend une étape A pour préparer un substrat revêtu de film mince de fer qui comprend un substrat et un film mince de fer qui est disposé sur le substrat et a une épaisseur de film de 200 à 1 800 nm, une étape B pour fournir un gaz qui comprend un composé de bore au substrat revêtu de film mince de fer pour former une couche de borure de fer qui comprend Fe2B sur la surface du film mince de fer du substrat revêtu de film mince de fer, et une étape C pour appliquer au moins un type de gaz choisi dans le groupe constitué d'azote gazeux et de gaz qui comprennent un composé azote au substrat revêtu de film mince de fer sur lequel la couche de borure de fer a été formée pour nitrurer le bore dans la couche de borure de fer. La présente invention concerne également un stratifié. 基板と、上記基板上に設けられ、膜厚が２００ｎｍ以上１８００ｎｍ以下の範囲である鉄薄膜と、を有する鉄薄膜付き基板を準備する工程Ａと、上記鉄薄膜付き基板に対し、ホウ素化合物を含むガスを供給することにより、上記鉄薄膜付き基板の上記鉄薄膜の面上に、Ｆｅ２Ｂを含むホウ化鉄層を形成する工程Ｂと、上記ホウ化鉄層が形成された鉄薄膜付き基板に対し、窒素ガス及び窒素化合物を含むガスからなる群より選ばれる少なくとも１種のガスを供給することにより、上記ホウ化鉄層中のホウ素を窒化させる工程Ｃと、を含む、六方晶窒化ホウ素薄膜の製造方法、及び、積層体。