MOLYBDENUM PRECURSOR COMPOUNDS

• Main Authors: WATSON, Michael, ZHAO, Pei, GARRETT, Benjamin R
• Format: Patent
• Language: English; French
• Published: 19.05.2023
• Subjects: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; ORGANIC CHEMISTRY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention provides certain molybdenum-containing compounds which are believed to be useful in the vapor deposition of molybdenum-containing films onto the surface of various microelectronic device substrates. In one aspect, the invention provides a process for depositing a molybdenum-containing film onto a microelectronic device substrate, which comprises exposing the substrate, in a reaction zone, to a compound of Formula (I) as described herein, under vapor deposition conditions. L'invention concerne certains composés contenant du molybdène qui sont supposés être utiles dans le dépôt en phase vapeur de films contenant du molybdène sur la surface de divers substrats de dispositif microélectronique. Selon un aspect, l'invention concerne un procédé de dépôt d'un film contenant du molybdène sur un substrat de dispositif microélectronique, qui comprend l'exposition du substrat, dans une zone de réaction, à un composé de formule (I) tel que présentement décrit, dans des conditions de dépôt en phase vapeur.