SUBSTRATE PROCESSING DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROGRAM

• Main Authors: YAMAGUCHI Takatomo, TAKEBAYASHI Yuji, OKAJIMA Yusaku, TATENO Hideto, ONO Kenji
• Format: Patent
• Language: English; French; Japanese
• Published: 30.03.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Provided is a feature having a protrusion and comprising: a reaction tube that processes a substrate; a first heating unit that heats the reaction tube; a second heating unit that heats the protrusion; and a heat-insulating member provided to the protrusion. L'invention concerne une caractérist...