SUBSTRATE PROCESSING DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND PROGRAM

• Main Authors: YAMAGUCHI Takatomo, TAKEBAYASHI Yuji, OKAJIMA Yusaku, TATENO Hideto, ONO Kenji
• Format: Patent
• Language: English; French; Japanese
• Published: 30.03.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Provided is a feature having a protrusion and comprising: a reaction tube that processes a substrate; a first heating unit that heats the reaction tube; a second heating unit that heats the protrusion; and a heat-insulating member provided to the protrusion. L'invention concerne une caractéristique ayant une saillie et comprenant : un tube de réaction qui traite un substrat; une première unité de chauffage qui chauffe le tube de réaction ; une seconde unité de chauffage qui chauffe la saillie ; et un élément d'isolation thermique disposé sur la saillie. 突出部を備え、基板を処理する反応管と、反応管を加熱する第１の加熱部と、突出部を加熱する第２の加熱部と、突出部に設けられる断熱部材と、を備える技術が提供される。