APPARATUSES FOR MEASURING GAP BETWEEN SUBSTRATE SUPPORT AND GAS DISTRIBUTION DEVICE

• Main Authors: BAPAT, Shriram Vasant, VINTILA, Adriana, SLEVIN, Damien Martin, ALDEN, Emily Ann
• Format: Patent
• Language: English; French
• Published: 03.11.2022
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Some embodiments provide apparatuses capable of enabling the measurement of various characteristics of a showerhead-substrate gap in a processing chamber, including at high temperatures and at low-light conditions, using an imaging system external to the processing chamber. Certains modes de réalisation concernent des appareils capables de permettre la mesure de diverses caractéristiques d'un espace de substrat de pomme de douche dans une chambre de traitement, y compris à des températures élevées et dans des conditions de faible lumière, à l'aide d'un système d'imagerie externe à la chambre de traitement.