TRANSISTOR CELL WITH SELF-ALIGNED GATE CONTACT

Disclosed are apparatuses including a transistor cell and methods of fabricating the transistor cell. The transistor cell may include a substrate, an active region and a gate having a gate contact in the active region. The transistor cell may further include a first portion of a spacer of the gate c...

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Bibliographic Details
Main Authors NALLAPATI, Giridhar, BAO, Junjing, ZHU, John Jianhong
Format Patent
LanguageEnglish
French
Published 27.10.2022
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Summary:Disclosed are apparatuses including a transistor cell and methods of fabricating the transistor cell. The transistor cell may include a substrate, an active region and a gate having a gate contact in the active region. The transistor cell may further include a first portion of a spacer of the gate contact formed from a first material, and a second portion of the spacer of the gate contact formed from a second material. Sont divulgués des appareils comprenant une cellule de transistor et des procédés de fabrication de la cellule de transistor. La cellule de transistor peut comprendre un substrat, une région active et une grille ayant un contact de grille dans la région active. La cellule de transistor peut en outre comprendre une première partie d'un élément d'espacement du contact de grille formé à partir d'un premier matériau, et une seconde partie de l'élément d'espacement du contact de grille formé à partir d'un second matériau.
Bibliography:Application Number: WO2022US71316