SILICA SUBSTRATES FOR SLOW RELEASE ASPHALTENE CONTROL CHEMICAL SQUEEZE TREATMENTS

The present disclosure provides methods and compositions for controlling asphaltenes in a subterranean formation. The compositions may include silica, a polymer, and optionally a charged surfactant. The compositions may also include a solvent or other additives. The methods may include injecting the...

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Bibliographic Details
Main Authors LUCENTE-SCHULTZ, Rebecca, RUSSELL, Christopher, NGUYEN, Duy, BHANDARI, Manojkumar, BARTELS, Jeremy
Format Patent
LanguageEnglish
French
Published 27.10.2022
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Summary:The present disclosure provides methods and compositions for controlling asphaltenes in a subterranean formation. The compositions may include silica, a polymer, and optionally a charged surfactant. The compositions may also include a solvent or other additives. The methods may include injecting the compositions into subterranean formations and inhibiting asphaltene precipitation. La présente divulgation concerne des procédés et des compositions destinés à réguler les asphaltènes dans une formation souterraine. Les compositions peuvent comprendre de la silice, un polymère et éventuellement un tensioactif chargé. Les compositions peuvent comprendre aussi un solvant ou d'autres additifs. Les procédés peuvent consister à injecter des compositions dans des formations souterraines et à inhiber la précipitation des asphaltènes.
Bibliography:Application Number: WO2021US64661