SEMICONDUCTOR PROCESSING WITH COOLED ELECTROSTATIC CHUCK

Embodiments described herein relate to a substrate support assembly. The substrate support assembly includes an ESC base assembly having a base channel disposed therein, a facility plate, the facility plate coupled to the ESC base assembly with a vacuum region therebetween, and a seal assembly. The...

Full description

Saved in:
Bibliographic Details
Main Authors PROUTY, Stephen Donald, BABAYAN, Steven E, SARODE VISHWANATH, Yogananda, SCHMID, Andreas, NOUJAIM, Andrew Antoine
Format Patent
LanguageEnglish
French
Published 18.08.2022
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:Embodiments described herein relate to a substrate support assembly. The substrate support assembly includes an ESC base assembly having a base channel disposed therein, a facility plate, the facility plate coupled to the ESC base assembly with a vacuum region therebetween, and a seal assembly. The seal assembly includes an upper flange coupled to the base channel of the ESC base assembly, the upper flange disposed in the facility plate, a lower flange coupled to the upper flange, the lower flange disposed in the facility plate, a gasket disposed between the upper flange and the lower flange, and an insulator tube coupled to the lower flange. A passage is connected to the base channel, the passage is defined by connected openings of the upper flange, the gasket, the lower flange, the insulator tube, and the base assembly. La présente invention concerne, selon des modes de réalisation, un ensemble de support de substrat. L'ensemble de support de substrat comprend un ensemble de base ESC dans lequel est disposé un canal de base, une plaque d'installation, la plaque d'installation étant couplée à l'ensemble de base ESC avec une zone de vide entre eux, et un ensemble d'étanchéité. L'ensemble d'étanchéité comprend une bride supérieure couplée au canal de base de l'ensemble de base ESC, la bride supérieure étant disposée dans la plaque d'installation, une bride inférieure couplée à la bride supérieure, la bride inférieure étant disposée dans la plaque d'installation, un joint d'étanchéité disposé entre la bride supérieure et la bride inférieure, et un tube isolant couplé à la bride inférieure. Un passage communique avec le canal de base, le passage est formé par les ouvertures raccordées de la bride supérieure, du joint d'étanchéité, de la bride inférieure, du tube isolant et de l'ensemble de base.
Bibliography:Application Number: WO2022US12341