DINUCLEAR MOLYBDENUM PRECURSORS FOR DEPOSITION OF MOLYBDENUM-CONTAINING FILMS

• Main Authors: YONG, Doreen Wei Ying, HUYNH, Han Vinh, DORDEVIC, Nemanja, LEONCINI, Andrea, MEHLMANN, Paul
• Format: Patent
• Language: English; French
• Published: 16.11.2023
• Subjects: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; ORGANIC CHEMISTRY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Dinuclear molybdenum coordination complexes are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a dinuclear molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum nitride). The exposures can be sequential or simultaneous. L'invention concerne des complexes de coordination de molybdène dinucléaires. L'invention concerne des procédés de dépôt de films contenant du molybdène sur un substrat. Le substrat est exposé à un précurseur de molybdène dinucléaire et à un réactif pour former le film contenant du molybdène (par exemple, du molybdène élémentaire, de l'oxyde de molybdène, du carbure de molybdène, du siliciure de molybdène, du nitrure de molybdène). Les expositions peuvent être séquentielles ou simultanées.