TUNABLE HIGH-CHI DIBLOCK COPOLYMERS CONSISTING OF ALTERNATING COPOLYMER SEGMENTS FOR DIRECTED SELF-ASSEMBLY AND APPLICATION THEREOF

• Main Authors: RAHMAN, Md S, JEONG, EunJeong, BASKARAN, Durairaj, MONREAL, Victor, NG, Edward W, BOBADE, Sachin
• Format: Patent
• Language: English; French
• Published: 23.06.2022
• Subjects: ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; CINEMATOGRAPHY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; CORRECTING FLUIDS; DYES; ELECTROGRAPHY; FILLING PASTES; HOLOGRAPHY; INKS; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MATERIALS THEREFOR; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NANOTECHNOLOGY; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; THEIR PREPARATION OR CHEMICAL WORKING-UP; TRANSPORTING; USE OF MATERIALS THEREFOR; WOODSTAINS

The disclosed subject matter relates to a block polymer comprising structure (1): (A)-(C)-(B), wherein (A) is a first polymer block segment comprising a block segment selected from structure (1a), structure (1b), and a mixture of structures (1a) an (1b), (C) is a spacer moiety comprising structure (1c); and wherein B) is a second polymer block segment comprising repeat units derived from either an alkyl 2-methylenealkanoate, a lactone; a cyclic carbonate, an oxirane, or an oxetane. The disclose matter also pertains to a composition of said block polymer in a spin casting solvent and using this solution in a process of directed self-assembly. L'objet divulgué se rapporte à un polymère séquencé comprenant la structure (1) : (A)-(C)-(B), dans laquelle (A) est un premier segment de bloc polymère comprenant un segment de bloc choisi parmi une structure (1a), une structure (1b) et un mélange de structures (1a) et (1b), (C) est une fraction d'espaceur comprenant une structure (1c) ; et dans laquelle (B) est un second segment de bloc polymère comprenant des unités de répétition dérivées d'un 2-méthylènealcanoate d'alkyle, d'une lactone ; d'un carbonate cyclique, d'un oxirane ou d'un oxétane. L'objet divulgué concerne également une composition dudit polymère séquencé dans un solvant de coulée par centrifugation et l'utilisation de cette solution dans un procédé d'auto-assemblage dirigé.