SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE

• Main Authors: ENDO, Toru, TSUKAHARA, Ryuta, NAOHARA, Hideji, HIGASHI, Katsuei, ISHIMARU, Akira, YAMAGUCHI, Takahiro, OKITA, Yuji
• Format: Patent
• Language: English; French; Japanese
• Published: 02.06.2022
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

This substrate treatment method includes: a substrate holding step for holding a substrate at a holding position surrounded by a cylindrical guard; a treatment liquid supply step for supplying a treatment liquid for treating a to-be-treated surface of the substrate to the to-be-treated surface of th...