CERAMIC COMPONENT WITH CHANNELS

A method for forming a component for a plasma processing chamber is provided. An internal mold is provided. An external mold is provided around the internal mold. The external mold is filled with a ceramic powder, wherein the ceramic powder surrounds the internal mold. The ceramic powder is sintered...

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Bibliographic Details
Main Authors DETERT, Douglas, KERNS, John Michael, WETZEL, David Joseph, LIU, Lei, XU, Lin, PAPE, Eric A, HAZARIKA, Pankaj
Format Patent
LanguageEnglish
French
Published 27.05.2022
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:A method for forming a component for a plasma processing chamber is provided. An internal mold is provided. An external mold is provided around the internal mold. The external mold is filled with a ceramic powder, wherein the ceramic powder surrounds the internal mold. The ceramic powder is sintered to form a solid part. The solid part is removed from the external mold. L'invention concerne un procédé de formation d'un composant pour une chambre de traitement au plasma. Un moule interne est prévu. Un moule externe est disposé autour du moule interne. Le moule externe est rempli d'une poudre céramique, la poudre céramique entourant le moule interne. La poudre céramique est frittée pour former une partie solide. La partie solide est retirée du moule externe.
Bibliography:Application Number: WO2021US57581