PHENOLIC FOAM AND METHOD FOR MANUFACTURING SAME

• Main Authors: PARK, Gun Pyo, HA, Hye Min, KIM, Hansu, BAE, Sungjae, KIM, Chaehoon, KIM, Saetbyeol, KIM, Dohun, KANG, Gilho, KIM, Myeong Hee, PARK, In Sung
• Format: Patent
• Language: English; French; Korean
• Published: 12.05.2022
• Subjects: AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; CHEMISTRY; COMPOSITIONS BASED THEREON; GENERAL PROCESSES OF COMPOUNDING; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; WORKING-UP

Provided is a phenolic foam having a thickness of 90 mm or more, wherein when equally dividing the phenolic foam into N (an odd number of N≥7) slices from one surface of the foam and along the surface in the thickness direction, the closed cell ratio of a first surface layer part (N1) is lower than the closed cell ratio of a second surface layer part (NN), and the slice (Nmin) having the smallest closed cell ratio from among the N slices is positioned between the first surface layer part (N1) and a middle slice (Nc). L'invention concerne une mousse phénolique ayant une épaisseur supérieure ou égale à 90 mm. Si on divise de manière égale la mousse phénolique en N (un nombre impair ≥ 7) tranches à partir d'une surface de la mousse et le long de la surface dans la direction de l'épaisseur, la proportion d'alvéoles fermées d'une première partie de couche de surface (N1) est inférieure à la proportion d'alvéoles fermées d'une seconde partie de couche de surface (NN) et la tranche (Nmin) ayant la plus petite proportion d'alvéoles fermées parmi les N tranches est positionnée entre la première partie de couche de surface (N1) et une tranche intermédiaire (Nc). 두께가 90㎜ 이상인 페놀 발포체이고, 상기 발포체의 어느 한 표면으로부터 그 표면을 따라 두께 방향으로 N (N≥7의 홀수)개의 절편으로 균분하였을 때, 제1 표층부(N1)의 독립기포율은 제2 표층부(NN)의 독립기포율보다 낮고, 상기 N개의 절편 중에서 최소 독립기포율을 갖는 절편(Nmin)은, 상기 제1 표층부(N1)와 가운데 절편(Nc) 사이에 위치하는 페놀 발포체가 제공된다.