CARRYING DEVICE AND SEMICONDUCTOR REACTION CHAMBER

• Main Authors: MAO, Xingfei, XU, Jinji
• Format: Patent
• Language: Chinese; English; French
• Published: 12.05.2022
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Disclosed in the present invention are a carrying device and a semiconductor reaction chamber. In the carrying device, a focusing ring assembly comprises: an upper focusing ring and a lower focusing ring; a groove is formed on the upper surface of the lower focusing ring, and the upper focusing ring is arranged in the groove in a height-adjustable manner; the area on the upper surface of the lower focusing ring and at the inner side of the groove is a supporting area, and the supporting area is flush with the upper surface of a chuck for supporting a wafer together; the upper surface of the upper focusing ring is higher than the supporting area when the upper focusing ring is located in the groove; the lower surface of the upper focusing ring is provided with a first limiting portion, and the first limiting portion is disposed corresponding to the groove; the upper end of each focusing ring ejector pin is provided with a second limiting portion, and the second limiting portion can work in conjunction with the