BLACK QUARTZ GLASS AND METHOD FOR MANUFACTURING SAME
The present invention pertains to: black quartz glass containing 0.5-10 mass% of Si and 0.1-5 mass% of SiO, with the remainder consisting of SiO2, and having an SCE reflectance of at most 10% at a wavelength of 350-750 nm; a method for manufacturing black quartz glass, the method comprising press-mo...
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Main Authors | , |
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Format | Patent |
Language | English French Japanese |
Published |
07.04.2022
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Subjects | |
Online Access | Get full text |
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