TITANIUM COMPLEX, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING TITANIUM-CONTAINING THIN FILM

• Main Authors: IKEMURA Shuya, YAMAMOTO Yuki, HAYAKAWA Teppei, OIKE Hiroyuki
• Format: Patent
• Language: English; French; Japanese
• Published: 13.01.2022
• Subjects: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; ORGANIC CHEMISTRY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Provided is a titanium complex which is useful for producing a titanium-containing thin film under low temperature film formation conditions in which an oxidizing gas is not used.　This titanium complex is represented by general formula (1) (in the formula, R1 and R2 each independently denote an alkyl group having 1-6 carbon atoms, and may bond to each other to form a ring. X denotes CR3 or a N atom. Y denotes CR4 or a N atom. Z denotes CR5 or a N atom. R3, R4 and R each independently denote a hydrogen atom or an alkyl group having 1-6 carbon atoms. n denotes an integer of 1-3). L'invention concerne un complexe de titane qui est utile pour la production d'un film mince contenant du titane dans les conditions de formation de film suivantes : à basse température et sans recours à un gaz oxydant.　Ce complexe de titane est représenté par la formule générale (1) (dans la formule, R1 et R2 représentent chacun indépendamment un groupe alkyle comportant de 1 à 6 atomes de carbone et peuvent se lier l'un à l'autre pour former un cycle. X représente CR3 ou un atome de N. Y représente CR4 ou un atome de N. Z représente CR5 ou un atome de N. R3, R4 et R représentent chacun indépendamment un atome d'hydrogène ou un groupe alkyle comportant de 1 à 6 atomes de carbone. n représente un nombre entier de 1 à 3). 酸化性ガスを用いない低温成膜条件下で、チタン含有薄膜を製造するのに有用なチタン錯体を提供する。　一般式（１） （式中、Ｒ１及びＲ２は各々独立に炭素数１～６のアルキル基を表し、互いに結合して環を形成していてもよい。ＸはＣＲ３又はＮ原子を表す。ＹはＣＲ４又はＮ原子を表す。ＺはＣＲ５又はＮ原子を表す。Ｒ３、Ｒ４及びＲ５は各々独立に水素原子又は炭素数１～６のアルキル基を表す。ｎは１～３の整数を表す。）で示されるチタン錯体。