FILM FORMING METHOD AND FILM FORMING APPARATUS
This film forming method comprises: a first step wherein a first aromatic hydrocarbon gas having a first functional group is supplied to a substrate that has been provided with an undercoat film; and a second step wherein the first aromatic hydrocarbon gas adsorbed on the surface of the undercoat fi...
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Main Authors | , |
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Format | Patent |
Language | English French Japanese |
Published |
30.12.2021
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Abstract | This film forming method comprises: a first step wherein a first aromatic hydrocarbon gas having a first functional group is supplied to a substrate that has been provided with an undercoat film; and a second step wherein the first aromatic hydrocarbon gas adsorbed on the surface of the undercoat film is activated by means of a plasma of a first reaction gas that contains at least a rare gas.
L'invention concerne un procédé de formation de film comprenant : une première étape dans laquelle un premier gaz hydrocarboné aromatique présentant un premier groupe fonctionnel est fourni à un substrat qui a été pourvu d'un film de sous-couche ; et une deuxième étape dans laquelle le premier gaz hydrocarboné aromatique adsorbé sur la surface du film de sous-couche est activé au moyen d'un plasma d'un premier gaz de réaction qui contient au moins un gaz rare.
成膜方法は、下地膜が形成された基板に第1官能基を有する第1芳香族炭化水素ガスを供給する第1工程と、少なくとも希ガスを含む第1反応ガスのプラズマにより、下地膜の表面上に吸着した第1芳香族炭化水素ガスを活性化させる第2工程とを含む。 |
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AbstractList | This film forming method comprises: a first step wherein a first aromatic hydrocarbon gas having a first functional group is supplied to a substrate that has been provided with an undercoat film; and a second step wherein the first aromatic hydrocarbon gas adsorbed on the surface of the undercoat film is activated by means of a plasma of a first reaction gas that contains at least a rare gas.
L'invention concerne un procédé de formation de film comprenant : une première étape dans laquelle un premier gaz hydrocarboné aromatique présentant un premier groupe fonctionnel est fourni à un substrat qui a été pourvu d'un film de sous-couche ; et une deuxième étape dans laquelle le premier gaz hydrocarboné aromatique adsorbé sur la surface du film de sous-couche est activé au moyen d'un plasma d'un premier gaz de réaction qui contient au moins un gaz rare.
成膜方法は、下地膜が形成された基板に第1官能基を有する第1芳香族炭化水素ガスを供給する第1工程と、少なくとも希ガスを含む第1反応ガスのプラズマにより、下地膜の表面上に吸着した第1芳香族炭化水素ガスを活性化させる第2工程とを含む。 |
Author | IFUKU, Ryota MATSUMOTO, Takashi |
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DocumentTitleAlternate | 成膜方法及び成膜装置 PROCÉDÉ ET APPAREIL DE FORMATION DE FILM |
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RelatedCompanies | TOKYO ELECTRON LIMITED |
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Snippet | This film forming method comprises: a first step wherein a first aromatic hydrocarbon gas having a first functional group is supplied to a substrate that has... |
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SubjectTerms | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
Title | FILM FORMING METHOD AND FILM FORMING APPARATUS |
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