METHOD FOR CLEANING A VACUUM CHAMBER, METHOD FOR VACUUM PROCESSING OF A SUBSTRATE, AND APPARATUSES FOR VACUUM PROCESSING A SUBSTRATE
A method for cleaning a vacuum chamber, particularly a vacuum chamber used in the manufacture of OLED devices is described. The method includes cleaning at least one of a surface of the vacuum chamber and a component inside the vacuum chamber with active species to remove contamination from the at l...
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Main Author | |
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Format | Patent |
Language | English French |
Published |
02.12.2021
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Subjects | |
Online Access | Get full text |
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Summary: | A method for cleaning a vacuum chamber, particularly a vacuum chamber used in the manufacture of OLED devices is described. The method includes cleaning at least one of a surface of the vacuum chamber and a component inside the vacuum chamber with active species to remove contamination from the at least one of the surface of the vacuum chamber and the component inside the vacuum chamber; and during cleaning, analyzing the removed contaminant.
L'invention concerne un procédé pour nettoyer une chambre à vide, en particulier une chambre à vide utilisée dans la fabrication de dispositifs OLED. Le procédé comprend le nettoyage d'une surface de la chambre à vide et/ou d'un composant à l'intérieur de la chambre à vide à l'aide d'espèces actives pour éliminer les contaminants de ladite surface de la chambre à vide et/ou du composant à l'intérieur de la chambre à vide ; et pendant le nettoyage, l'analyse des contaminants éliminés. |
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Bibliography: | Application Number: WO2020IB54968 |