METHOD FOR CLEANING A VACUUM CHAMBER, METHOD FOR VACUUM PROCESSING OF A SUBSTRATE, AND APPARATUSES FOR VACUUM PROCESSING A SUBSTRATE

• Main Author: RADEK, Manuel
• Format: Patent
• Language: English; French
• Published: 02.12.2021
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

A method for cleaning a vacuum chamber, particularly a vacuum chamber used in the manufacture of OLED devices is described. The method includes cleaning at least one of a surface of the vacuum chamber and a component inside the vacuum chamber with active species to remove contamination from the at least one of the surface of the vacuum chamber and the component inside the vacuum chamber; and during cleaning, analyzing the removed contaminant. L'invention concerne un procédé pour nettoyer une chambre à vide, en particulier une chambre à vide utilisée dans la fabrication de dispositifs OLED. Le procédé comprend le nettoyage d'une surface de la chambre à vide et/ou d'un composant à l'intérieur de la chambre à vide à l'aide d'espèces actives pour éliminer les contaminants de ladite surface de la chambre à vide et/ou du composant à l'intérieur de la chambre à vide ; et pendant le nettoyage, l'analyse des contaminants éliminés.