SEMICONDUCTOR DEVICE AND METHOD FOR SEMICONDUCTOR DEVICE FABRICATION

• Main Authors: YANAGISAWA, Yuichi, IIKUBO, Yoichi, YAMAGUCHI, Daisuke
• Format: Patent
• Language: English; French; Japanese
• Published: 30.09.2021
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Provided is a high-yield method for semiconductor device fabrication. When forming a film of a gate insulator or an insulator in contact with an oxide semiconductor such as an interlayer film in a semiconductor device having the oxide semiconductor on a substrate, the insulator film can be formed wi...