CARRIER FILM FOR SEMICONDUCTOR WAFER PROCESSING
A carrier film includes an adhesive layer, a core layer, and a release layer. The adhesive layer includes a hydrogenated styrene block copolymer having a storage modulus (G') of less than or equal to 400 kPa at 25°C, and a first polyolefin elastomer. The core layer includes a second polyolefin...
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Main Authors | , , |
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Format | Patent |
Language | English French |
Published |
10.09.2021
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Subjects | |
Online Access | Get full text |
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Summary: | A carrier film includes an adhesive layer, a core layer, and a release layer. The adhesive layer includes a hydrogenated styrene block copolymer having a storage modulus (G') of less than or equal to 400 kPa at 25°C, and a first polyolefin elastomer. The core layer includes a second polyolefin elastomer, and the release layer includes a polyolefin.
La présente invention concerne un film de support qui comprend une couche adhésive, une couche centrale et une couche de libération. La couche adhésive comprend un copolymère séquencé de styrène hydrogéné ayant un module de stockage (G') inférieur ou égal à 400 kPa à 25 °C, et un premier élastomère de polyoléfine. La couche centrale comprend un second élastomère de polyoléfine et la couche de libération comprend une polyoléfine. |
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Bibliography: | Application Number: WO2021US20877 |