THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREFOR
Disclosed in the present invention are a thin film transistor array panel and a manufacturing method therefor. The method comprises: forming a device plate, and sequentially stacking a substrate, a gate electrode, a gate insulating layer, an active layer, and a metal layer on the device plate; formi...
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Main Author | |
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Format | Patent |
Language | Chinese English French |
Published |
12.08.2021
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Subjects | |
Online Access | Get full text |
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Summary: | Disclosed in the present invention are a thin film transistor array panel and a manufacturing method therefor. The method comprises: forming a device plate, and sequentially stacking a substrate, a gate electrode, a gate insulating layer, an active layer, and a metal layer on the device plate; forming a photoresist layer on the metal layer, wherein the photoresist layer comprises a first portion of the photoresist layer and a second portion of the photoresist layer; using a combination of a mask plate and a laser beam to treat the first portion of the photoresist layer, so as to remove the first portion of the photoresist layer; treating the metal layer to form a source electrode pattern, a drain electrode pattern, and a channel region; and stripping the second portion of the photoresist layer.
La présente invention concerne un panneau matriciel de transistors à couches minces et un procédé de fabrication associé. Le procédé comprend : la formation d'une plaque de dispositif, et l'empilage séquentiel d'un sub |
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Bibliography: | Application Number: WO2020CN79567 |