THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREFOR

Disclosed in the present invention are a thin film transistor array panel and a manufacturing method therefor. The method comprises: forming a device plate, and sequentially stacking a substrate, a gate electrode, a gate insulating layer, an active layer, and a metal layer on the device plate; formi...

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Bibliographic Details
Main Author ZHENG, Libin
Format Patent
LanguageChinese
English
French
Published 12.08.2021
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Summary:Disclosed in the present invention are a thin film transistor array panel and a manufacturing method therefor. The method comprises: forming a device plate, and sequentially stacking a substrate, a gate electrode, a gate insulating layer, an active layer, and a metal layer on the device plate; forming a photoresist layer on the metal layer, wherein the photoresist layer comprises a first portion of the photoresist layer and a second portion of the photoresist layer; using a combination of a mask plate and a laser beam to treat the first portion of the photoresist layer, so as to remove the first portion of the photoresist layer; treating the metal layer to form a source electrode pattern, a drain electrode pattern, and a channel region; and stripping the second portion of the photoresist layer. La présente invention concerne un panneau matriciel de transistors à couches minces et un procédé de fabrication associé. Le procédé comprend : la formation d'une plaque de dispositif, et l'empilage séquentiel d'un sub
Bibliography:Application Number: WO2020CN79567