DEPOSITION COMPOSITIONS AND METHODS OF MAKING AND USING SAME

• Main Authors: LUNDBERG, David J, BULINSKI, Michael J, KEHREN, Jason M, QIU, Zai-Ming, MONTEIL, Alexandre R, COSTELLO, Michael G
• Format: Patent
• Language: English; French
• Published: 05.08.2021
• Subjects: ADHESIVES; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; CORRECTING FLUIDS; DYES; FILLING PASTES; INKS; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; POLISHES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS; USE OF MATERIALS THEREFOR; WOODSTAINS

A deposition composition includes a solvent comprising a hydrofluorothioether compound represented by the following general formula (I): Rf-S-Rh where Rf is a fluorinated or perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and...