DEPOSITION COMPOSITIONS AND METHODS OF MAKING AND USING SAME

A deposition composition includes a solvent comprising a hydrofluorothioether compound represented by the following general formula (I): Rf-S-Rh where Rf is a fluorinated or perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and...

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Main Authors LUNDBERG, David J, BULINSKI, Michael J, KEHREN, Jason M, QIU, Zai-Ming, MONTEIL, Alexandre R, COSTELLO, Michael G
Format Patent
LanguageEnglish
French
Published 05.08.2021
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Summary:A deposition composition includes a solvent comprising a hydrofluorothioether compound represented by the following general formula (I): Rf-S-Rh where Rf is a fluorinated or perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and Rh is a non-fluorinated hydrocarbon group having 1-3 carbon atoms. The deposition composition further includes a coating material that is soluble or dispersible in said solvent. Une composition de dépôt comprend un solvant comprenant un composé hydrofluorothioéther représenté par la formule générale (I) suivante : Rf-S-Rh, Rf étant un groupe fluoré ou perfluoré ayant 2 à 9 atomes de carbone et comprenant éventuellement un ou plusieurs hétéroatomes caténés ou atomes de chlore, et Rh est un groupe hydrocarboné non fluoré ayant de 1 à 3 atomes de carbone. La composition de dépôt comprend en outre un matériau de revêtement qui est soluble ou dispersible dans ledit solvant.
Bibliography:Application Number: WO2021IB50463