DEPOSITION COMPOSITIONS AND METHODS OF MAKING AND USING SAME
A deposition composition includes a solvent comprising a hydrofluorothioether compound represented by the following general formula (I): Rf-S-Rh where Rf is a fluorinated or perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and...
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Main Authors | , , , , , |
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Format | Patent |
Language | English French |
Published |
05.08.2021
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Subjects | |
Online Access | Get full text |
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Summary: | A deposition composition includes a solvent comprising a hydrofluorothioether compound represented by the following general formula (I): Rf-S-Rh where Rf is a fluorinated or perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and Rh is a non-fluorinated hydrocarbon group having 1-3 carbon atoms. The deposition composition further includes a coating material that is soluble or dispersible in said solvent.
Une composition de dépôt comprend un solvant comprenant un composé hydrofluorothioéther représenté par la formule générale (I) suivante : Rf-S-Rh, Rf étant un groupe fluoré ou perfluoré ayant 2 à 9 atomes de carbone et comprenant éventuellement un ou plusieurs hétéroatomes caténés ou atomes de chlore, et Rh est un groupe hydrocarboné non fluoré ayant de 1 à 3 atomes de carbone. La composition de dépôt comprend en outre un matériau de revêtement qui est soluble ou dispersible dans ledit solvant. |
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Bibliography: | Application Number: WO2021IB50463 |