LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGING A TRAJECTORY OF PARTICULATE DEBRIS
An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening ar...
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Main Authors | , , , , , , , , , , , , , , , , , , |
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Format | Patent |
Language | English French |
Published |
29.07.2021
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Subjects | |
Online Access | Get full text |
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Summary: | An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.
Appareil comprenant : un appareil de réception de rayonnement pourvu d'une ouverture permettant de recevoir un rayonnement provenant d'une source de rayonnement à travers l'ouverture; l'appareil de réception de rayonnement comprenant un appareil de déviation agencé pour modifier une trajectoire d'une particule arrivant au niveau de l'appareil de réception de rayonnement, à travers l'ouverture. |
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Bibliography: | Application Number: WO2020EP87889 |