LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGING A TRAJECTORY OF PARTICULATE DEBRIS

An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening ar...

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Main Authors BANINE, Vadim, NIKIPELOV, Andrey, DE VRIES, Sjoerd, HUANG, Yang-Shan, TE SLIGTE, Edwin, VAN DE KERKHOF, Marcus, NENCHEV, Georgi, UMSTADTER, Karl, UZGÖREN, Eray, BAL, Kursat, YAGHOOBI, Parham, RAASVELD, Thomas, HUANG, Zhuangxiong, BRULS, Richard, JACOBS, Johannes, ALBRIGHT, Ronald, MOORS, Johannes, FRIJNS, Olav, RANJAN, Manish
Format Patent
LanguageEnglish
French
Published 29.07.2021
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Summary:An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus. Appareil comprenant : un appareil de réception de rayonnement pourvu d'une ouverture permettant de recevoir un rayonnement provenant d'une source de rayonnement à travers l'ouverture; l'appareil de réception de rayonnement comprenant un appareil de déviation agencé pour modifier une trajectoire d'une particule arrivant au niveau de l'appareil de réception de rayonnement, à travers l'ouverture.
Bibliography:Application Number: WO2020EP87889