DERIVATIZED POLYAMINO ACIDS

• Main Authors: IVANOV, Roman A, DOCKERY, Kevin P, BAILEY, David, ZHANG, Na, SHUKLA, Deepak
• Format: Patent
• Language: English; French
• Published: 15.07.2021
• Subjects: ADHESIVES; BASIC ELECTRIC ELEMENTS; CHEMISTRY; DRESSING OR CONDITIONING OF ABRADING SURFACES; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; PERFORMING OPERATIONS; POLISHES; POLISHING; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SEMICONDUCTOR DEVICES; SKI WAXES; TRANSPORTING

A composition comprises, consists of, or consists essentially of a polymer including a derivatized amino acid monomer unit. A chemical mechanical polishing composition includes a water based liquid carrier, abrasive particles dispersed in the liquid carrier, and a cationic polymer having a derivatized amino acid monomer unit. A method of chemical mechanical polishing includes utilizing the chemical mechanical polishing composition to remove at least a portion of a metal or dielectric layer from a substrate and thereby polish the substrate. La présente invention concerne une composition qui comprend, est constituée de, ou est essentiellement constituée d'un polymère comprenant un motif monomère de dérivé d'acide aminé. Une composition de polissage mécano-chimique comprend un vecteur liquide à base d'eau, des particules abrasives dispersées dans le vecteur liquide et un polymère cationique ayant un motif monomère de dérivé d'acide aminé. Un procédé de polissage mécano-chimique comprend l'utilisation de la composition de polissage mécano-chimique pour éliminer au moins une partie d'une couche métallique ou diélectrique d'un substrat et ainsi polir le substrat.