POLYIMIDE-BASED FILM HAVING EXCELLENT SURFACE EVENNESS AND METHOD FOR PRODUCING SAME

• Main Authors: YANG, Jong Won, PARK, Hyo Jun
• Format: Patent
• Language: English; French; Korean
• Published: 01.04.2021
• Subjects: AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; CHEMISTRY; COMPOSITIONS BASED THEREON; GENERAL PROCESSES OF COMPOUNDING; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; WORKING-UP

The present invention relates to a polyimide-based film and a method for producing same, and more particularly, to a polyimide-based film having a low Kc value of 1.55 or less, having excellent surface evenness, and suppressing the occurrence of waviness, and a method for producing same. La présente invention concerne un film à base de polyimide et son procédé de production, et plus particulièrement, un film à base de polyimide ayant une faible valeur de Kc de 1,55 ou moins, ayant une excellente planéité de surface, et supprimant l'apparition d'ondulations, et son procédé de production. 본 발명은 폴리이미드계 필름 및 이의 제조방법에 관한 것으로, 보다 상세하게는, 1.55 이하의 낮은 Kc값을 가져 우수한 표면 평탄성을 가지며, 웨이브니스(waviness)의 발생이 억제된 폴리이미드계 필름 및 그 제조방법에 관한 것이다.