CURING AGENT, METHOD FOR PRODUCING CEMENT STRUCTURE WITH COATING FILM, SHRINKAGE REDUCTION METHOD AND DRYING SUPPRESSION METHOD FOR CEMENT MOLDED BODY, AND METHOD FOR SUPPRESSING PENETRATION OF DETERIORATION FACTOR INTO CEMENT STRUCTURE

• Main Authors: KAWAI Hajime, INUBUSHI Ryosuke
• Format: Patent
• Language: English; French; Japanese
• Published: 06.08.2020
• Subjects: ARTIFICIAL STONE; BUILDING; BUILDING IMPLEMENTS OR OTHER BUILDING AIDS, OR THEIRUSE; CEMENTS; CERAMICS; CHEMISTRY; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS; CONCRETE; FIXED CONSTRUCTIONS; FORMS; HANDLING BUILDING MATERIALS ON THE SITE; LIME, MAGNESIA; METALLURGY; PERFORMING OPERATIONS; REFRACTORIES; REPAIRING, BREAKING-UP OR OTHER WORK ON EXISTINGBUILDINGS; SCAFFOLDING; SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG, OR MIXTURESCONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER; SHUTTERING; SLAG; TRANSPORTING; TREATMENT OF NATURAL STONE; WORKING CEMENT, CLAY, OR STONE

A curing agent which contains a diester compound represented by formula (I). (In formula (I), each of R1 and R2 independently represents a hydrogen atom or a monovalent hydrocarbon group having 1-15 carbon atoms, or alternatively, R1 and R2 may combine together to form a divalent hydrocarbon group having 3-15 carbon atoms; and each of R3 and R4 independently represents a monovalent organic group having 1-30 carbon atoms, or alternatively, R3 and R4 may combine together to form a divalent organic group having 3-30 carbon atoms.) L'invention concerne un agent de durcissement qui contient un composé de diester représenté par la formule (I). (Dans la formule (I), chacun des R1 et R2 représente indépendamment un atome d'hydrogène ou un groupe hydrocarboné monovalent comportant de 1 à 15 atomes de carbone ou, en variante, R1 et R2 peuvent se combiner pour former un groupe hydrocarboné divalent comportant de 3 à 15 atomes de carbone ; et chacun des R3 et R4 représente indépendamment un groupe organique monovalent comportant de 1 à 30 atomes de carbone, ou en variante, R3 et R4 peuvent se combiner pour former un groupe organique divalent comportant de 3 à 30 atomes de carbone.) 下記式（Ｉ）で表されるジエステル化合物を含有する、養生剤。（式（Ｉ）において、Ｒ１及びＲ２は、それぞれ独立に水素原子、若しくは１～１５個の炭素原子を有する一価の炭化水素基である、又はＲ１及びＲ２が一緒になって３～１５個の炭素原子を有する２価の炭化水素基を形成しており、Ｒ３及びＲ４は、それぞれ独立に１～３０個の炭素原子を有する１価の有機基を表す、又はＲ３及びＲ４が一緒になって３～３０個の炭素原子を有する２価の有機基を形成している。