HEAT CONDUCTIVE SPACER FOR PLASMA PROCESSING CHAMBER

• Main Authors: CHOI, Soo Young, PARK, Beom Soo, ZHAO, Lai, SEQUEIRA, Jeevan Prakash, CHEN, Wei-Ting, HSU, Cheng-Hang, YANG, Hsiao-Ling, LAU, Allen K, SUNG, Won Ho, OH, Sang Jeong, FURUTA, Gaku, HONG, Hyun Young, TINER, Robin L, LI, Jianheng
• Format: Patent
• Language: English; French
• Published: 02.07.2020
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY

Aspects of the present disclosure relate to a heat conductive spacer for use within a lid assembly of a plasma processing chamber. In one implementation, a plasma processing chamber includes a chamber body, and a lid assembly coupled to the chamber body defining a processing volume. The lid assembly...